China startup demoes prototype EUV light source

Chinese startup Langdao Silex demonstrated the FlintNano LPP-OXXO, the first homegrown EUV laser source using laser-produced plasma (LPP). The system delivers over 15 W of EUV output, utilizing approximately 90% domestically sourced components to pursue supply chain independence. Although the technology mirrors ASML processes, it will likely take many years to reach sufficient power levels. China still requires significant further advancements to develop a practical EUV lithography tool for advanced chip manufacturing purposes.